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Optical Characterization Of Real Surfaces And Films

Author: K. Vedam
Publisher: Academic Press
ISBN: 1483288935
Size: 27.69 MB
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This new volume of the highly respected Physics of Thin Films Serial discusses inhomogeneity in real films and surfaces. The volume, guest-edited by K. Vedam, follows the growth of thin films both from the surface of the substrate, and from the atomic level, layer by layer. The text features coverage of Real-Time Spectroscopic Ellipsometry (RTSE) and Reflectance Anisotropy (RA), two major breakthrough optical techniques used to characterize real time and insitu films and surfaces. In six insightful chapters, the contributors assess the impact of these techniques, their strengths and limitations, and their potential for further development.

Advances In Research And Development

Author:
Publisher: Elsevier
ISBN: 0080542883
Size: 63.61 MB
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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of twenty volumes since 1963. The series contains quality studies of the properties of various thinfilms materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. Discusses the latest research about structure, physics, and infrared photoemissive behavior of heavily doped silicon homojunctions and Ge and GaAs-based alloy junctions Reviews the current status of SiGe/Si quantum wells for infrared detection Discusses key developments in the growing research on quantum-well infrared photodetectors (QWIPs) Reviews Chois development of a family of novel three-terminal, multi-quantum well devices designed to improve high-temperature IR detectivity at long wavelengths Describes recent studies aimed at using multi-quantum well structures to achieve higher performance in solar cell devices based on materials systems

Physico Chemical Phenomena In Thin Films And At Solid Surfaces

Author:
Publisher: Elsevier
ISBN: 9780080480015
Size: 36.56 MB
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The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies. A number of questions are included at the end of many chapters to further reinforce the material presented. · Unified approach to the description of numerous physico-chemical phenomena in different materials · Based on the pioneering research work of the authors · Explantion of a variety of experimental observations · Material is presented at two levels of complexity for specialists and non-specialists · Identifies existing and potential applications of the processes and phenomena · Includes questions at the end of some chapters to further reinforce the material discussed

Cu In1 Xgax Se2 Based Thin Film Solar Cells

Author: Subba Ramaiah Kodigala
Publisher: Academic Press
ISBN: 9780080920320
Size: 16.88 MB
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Cu(In1-xGax)Se2 Based Thin Film Solar Cells provides valuable contents about the fabrication and characterization of chalcopyrite Cu(In1-xGax)Se2 based thin film solar cells and modules. The growth of chalcopyrite Cu(In1-xGax)(S1-ySey)2 absorbers, buffers, window layers, antireflection coatings, and finally metallic grids, which are the sole components of solar cells, is clearly illustrated. The absorber, which contains multiple elements, segregates secondary phases if the growth conditions are not well optimized i.e., the main drawback in the fabrication of solar cells. More importantly the solutions for the growth of thin films are given in detail. The properties of all the individual layers and single crystals including solar cells analyzed by different characterization techniques such as SEM, AFM, XPS, AES, TEM, XRD, optical, photoluminescence, and Raman spectroscopy are explicitly demonstrated. The electrical analyses such as conductivities, Hall mobilities, deep level transient spectroscopy measurements etc., provide a broad picture to understand thin films or single crystals and their solar cells. The book clearly explains the working principle of energy conversion from solar to electrical with basic sciences for the chalcopyrite based thin film solar cells. Also, it demonstrates important criteria on how to enhance efficiency of the solar cells and modules. The effect of environmental factors such as temperature, humidity, aging etc., on the devices is mentioned by citing several examples. Illustrates a number of growth techniques to prepare thin film layers for solar cells Discusses characterization techniques such as XRD, TEM, XPS, AFM, SEM, PL, CL, Optical measurements, and Electrical measurements Includes I-V, C-V measurements illustrations Provides analysis of solar cell efficiency Presents current trends in thin film solar cells research and marketing

Advances In Plasma Grown Hydrogenated Films

Author:
Publisher: Elsevier
ISBN: 0080542875
Size: 41.13 MB
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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new title reflects more accurately the rapidly growing inclusion of research and development efforts on nanostructures, especially in relation to novel solid-state device formats

Modeling Of Film Deposition For Microelectronic Applications

Author: Stephen M. Rossnagel
Publisher:
ISBN:
Size: 77.95 MB
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Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 22 volumes since 1963. The series contains quality studies of the properties of various thin filmsmaterials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.

Metal Oxide Based Thin Film Structures

Author: Nini Pryds
Publisher: Elsevier
ISBN: 0081017529
Size: 11.53 MB
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Metal Oxide-Based Thin Film Structures: Formation, Characterization and Application of Interface-Based Phenomena bridges the gap between thin film deposition and device development by exploring the synthesis, properties and applications of thin film interfaces. Part I deals with theoretical and experimental aspects of epitaxial growth, the structure and morphology of oxide-metal interfaces deposited with different deposition techniques and new developments in growth methods. Part II concerns analysis techniques for the electrical, optical, magnetic and structural properties of thin film interfaces. In Part III, the emphasis is on ionic and electronic transport at the interfaces of Metal-oxide thin films. Part IV discusses methods for tailoring metal oxide thin film interfaces for specific applications, including microelectronics, communication, optical electronics, catalysis, and energy generation and conservation. This book is an essential resource for anyone seeking to further their knowledge of metal oxide thin films and interfaces, including scientists and engineers working on electronic devices and energy systems and those engaged in research into electronic materials. Introduces the theoretical and experimental aspects of epitaxial growth for the benefit of readers new to the field Explores state-of-the-art analysis techniques and their application to interface properties in order to give a fuller understanding of the relationship between macroscopic properties and atomic-scale manipulation Discusses techniques for tailoring thin film interfaces for specific applications, including information, electronics and energy technologies, making this book essential reading for materials scientists and engineers alike

The Physics Of Thin Film Optical Spectra

Author: Olaf Stenzel
Publisher: Springer
ISBN: 3319216023
Size: 63.25 MB
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The book bridges the gap between fundamental physics courses (such as optics, electrodynamics, quantum mechanics and solid state physics) and highly specialized literature on the spectroscopy, design, and application of optical thin film coatings. Basic knowledge from the above-mentioned courses is therefore presumed. Starting from fundamental physics, the book enables the reader derive the theory of optical coatings and to apply it to practically important spectroscopic problems. Both classical and semiclassical approaches are included. Examples describe the full range of classical optical coatings in various spectral regions as well as highly specialized new topics such as rugate filters and resonant grating waveguide structures. The second edition has been updated and extended with respect to probing matter in different spectral regions, homogenous and inhomogeneous line broadening mechanisms and the Fresnel formula for the effect of planar interfaces.

Physics Of Thin Films

Author: Maurice H. Francombe
Publisher: Elsevier
ISBN: 1483103307
Size: 30.40 MB
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Physics of Thin Films: Advances in Research and Development primarily deals with the influence of ions or optical energy on the deposition, properties, and etching on thin films. The book is a collection of five articles, with one article per chapter. Chapter 1 covers ionized cluster beam deposition; epitaxy; and film-formation mechanism. Chapter 2 discusses the activated reactive evaporation process; the deposition of refractory compounds; the role of plasma in the process; and its applications. Chapter 3 focuses on ion-beam processing of optical thin films; ion sources and ion-surface interactions; and the different kinds of bombardment involved. Chapter 4 deals with laser induced etching - its mechanisms, methods, and applications. Chapter 5 talks about contacts to GaAs devices; Fermi-level pinning; and heterojunction contacts. The book is recommended for physicists and engineers in the field of electronics who would like to know more about thin films and the progresses in the field.