Download semiconductor silicon crystal technology in pdf or read semiconductor silicon crystal technology in pdf online books in PDF, EPUB and Mobi Format. Click Download or Read Online button to get semiconductor silicon crystal technology in pdf book now. This site is like a library, Use search box in the widget to get ebook that you want.

Semiconductor Silicon Crystal Technology

Author: Fumio Shimura
Publisher: Elsevier
ISBN: 0323150489
Size: 25.44 MB
Format: PDF, Mobi
View: 6088
Download and Read
Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.

Handbook Of Semiconductor Silicon Technology

Author: William C. O'Mara
Publisher: William Andrew
Size: 19.88 MB
Format: PDF, Mobi
View: 6771
Download and Read
This handbook is a comprehensive summary of the science, technology and manufacturing of semiconductor silicon materials. Every known property of silicon is detailed. A complete set of binary phase diagrams is included. Practical aspects such as materials handling, safety, impurity and defect reduction are also discussed in depth. Fundamentals in the areas of silicon precursor compounds, polysilicon, silicon crystal growth, wafer fabrication, epitaxial and CVD deposition are addressed by experts in these fields. Materials properties covered include electrical, optical and mechanical properties, deep level impurities and carrier lifetime, and thermochemistry, as well as specific sections on oxygen, carbon, and nitrogen impurities. The book contains an extensive set of references, tables of materials constants, and silicon properties, and a presentation on the state of the art of materials manufacturing.

Crystal Growth And Evaluation Of Silicon For Vlsi And Ulsi

Author: Golla Eranna
Publisher: CRC Press
ISBN: 1482232820
Size: 21.72 MB
Format: PDF, ePub, Mobi
View: 3472
Download and Read
Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemically inert and stable, but growing it as a single crystal creates many technological challenges. Crystal Growth and Evaluation of Silicon for VLSI and ULSI is one of the first books to cover the systematic growth of silicon single crystals and the complete evaluation of silicon, from sand to useful wafers for device fabrication. Written for engineers and researchers working in semiconductor fabrication industries, this practical text: Describes different techniques used to grow silicon single crystals Explains how grown single-crystal ingots become a complete silicon wafer for integrated-circuit fabrication Reviews different methods to evaluate silicon wafers to determine suitability for device applications Analyzes silicon wafers in terms of resistivity and impurity concentration mapping Examines the effect of intentional and unintentional impurities Explores the defects found in regular silicon-crystal lattice Discusses silicon wafer preparation for VLSI and ULSI processing Crystal Growth and Evaluation of Silicon for VLSI and ULSI is an essential reference for different approaches to the selection of the basic silicon-containing compound, separation of silicon as metallurgical-grade pure silicon, subsequent purification, single-crystal growth, and defects and evaluation of the deviations within the grown crystals.

Single Crystals Of Electronic Materials

Author: Roberto Fornari
Publisher: Woodhead Publishing
ISBN: 008102097X
Size: 30.71 MB
Format: PDF, Kindle
View: 1273
Download and Read
Single Crystals of Electronic Materials: Growth and Properties is a complete overview of the state-of-the-art growth of bulk semiconductors. It is not only a valuable update on the body of information on crystal growth of well-established electronic materials, such as silicon, III-V, II-VI and IV-VI semiconductors, but also includes chapters on novel semiconductors, such as wide bandgap oxides like ZnO, Ga2, O3, In2, O3, Al2, O3, nitrides (AIN and GaN), and diamond. Each chapter focuses on a specific material, providing a comprehensive overview that includes applications and requirements, thermodynamic properties, schematics of growth methods, and more. Presents the latest research and most comprehensive overview of both standard and novel semiconductors Provides a systematic examination of important electronic materials, including their applications, growth methods, properties, technologies and defect and doping issues Takes a close look at emerging materials, including wide bandgap oxides, nitrides and diamond

Technologie Hochintegrierter Schaltungen

Author: Dietrich Widmann
Publisher: Springer-Verlag
ISBN: 3642970591
Size: 65.11 MB
Format: PDF, ePub
View: 5304
Download and Read
Im vorliegenden Buch wird die Technologie von hochintegrierten Schaltungen behandelt. Es werden zunächst sehr ausführlich und praxisnah die verschiedenen technologischen Verfahren und Einzelprozesse aus den Bereichen Lithographie, Schicht-, Ätz- und Dotiertechnik beschrieben. Danach folgen Beispiele für die Integration der Einzelprozesse zur Herstellung von CMOS-, Bipolar- und BICMOS-Schaltungen. Sowohl die Einzelprozesse als auch die Prozeßintegration sind anschaulich mit zahlreichen Bildern dargestellt. Das Buch vermittelt nicht nur eine gute Übersicht, sondern auch sehr detaillierte Informationen über den modernsten Stand der Technologie hochintegrierter Schaltungen, wie sie z.B. bei der Herstellung des dynamischen IMEGA-Bit-Speichers Anwendung findet. Darüber hinausgehende Entwicklungen, die in den Sub-Mikrometer-Bereich führen, werden ebenfalls beschrieben.