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Microfabrication For Industrial Applications

Author: Regina Luttge
Publisher: William Andrew
ISBN: 081551977X
Size: 17.74 MB
Format: PDF, ePub, Mobi
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This book focuses on the industrial perspective for micro- and nanofabrication methods including large-scale manufacturing, transfer of concepts from lab to factory, process tolerance, yield, robustness, and cost. It gives a history of miniaturization, micro- and nanofabrication, and surveys industrial fields of application, illustrating fabrication processes of relevant micro and nano devices. Concerning sub-micron feature manufacture, the book explains: the philosophy of micro/ nanofabrication for integrated circuit industry; thin film deposition; (waveguide, plastic, semiconductor) material processing; packaging; interconnects; stress (e.g., thin film residual); economic; and environmental aspects. Micro/nanomechanical sensors and actuators are explained in depth with information on applications, materials (incl. functional polymers), methods, testing, fabrication, integration, reliability, magnetic microstructures, etc. Shows engineers & students how to evaluate the potential value of current and nearfuture manufacturing processes for miniaturized systems in industrial environments Explains the top-down and bottom up approaches to nanotechnology, nanostructures fabricated with beams, nano imprinting methods, nanoparticle manufacturing (and their health aspects), nanofeature analysis, and connecting nano to micro to macro Discusses issues for practical application cases; possibilities of dimension precision; large volume manufacturing of micro- & nanostructures (machines, materials, costs) Explains applications of Microsystems for information technology, e.g.: data recording (camera, microphone), storage (memories, CDs), communication; computing; and displays (beamers, LCD, TFT) Case studies are given for sensors, resonators, probes, transdermal medical systems, micro- pumps & valves, inkjets, DNA-analysis, lab-on-a-chip, & micro-cooling

Semiconductor Materials Analysis And Fabrication Process Control

Author: G.M. Crean
Publisher: Elsevier
ISBN: 0444596917
Size: 63.63 MB
Format: PDF
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There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.

Fundamentals Of Semiconductor Manufacturing And Process Control

Author: Gary S. May
Publisher: John Wiley & Sons
ISBN: 0471790273
Size: 67.43 MB
Format: PDF, ePub, Docs
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A practical guide to semiconductor manufacturing from process control to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Control covers all issues involved in manufacturing microelectronic devices and circuits, including fabrication sequences, process control, experimental design, process modeling, yield modeling, and CIM/CAM systems. Readers are introduced to both the theory and practice of all basic manufacturing concepts. Following an overview of manufacturing and technology, the text explores process monitoring methods, including those that focus on product wafers and those that focus on the equipment used to produce wafers. Next, the text sets forth some fundamentals of statistics and yield modeling, which set the foundation for a detailed discussion of how statistical process control is used to analyze quality and improve yields. The discussion of statistical experimental design offers readers a powerful approach for systematically varying controllable process conditions and determining their impact on output parameters that measure quality. The authors introduce process modeling concepts, including several advanced process control topics such as run-by-run, supervisory control, and process and equipment diagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and management of overall manufacturing systems * Chapters include case studies, sample problems, and suggested exercises * Instructor support includes electronic copies of the figures and an instructor's manual Graduate-level students and industrial practitioners will benefit from the detailed exami?nation of how electronic materials and supplies are converted into finished integrated circuits and electronic products in a high-volume manufacturing environment. An Instructor's Manual presenting detailed solutions to all the problems in the book is available from the Wiley editorial department. An Instructor Support FTP site is also available.

Materials Processing And Manufacturing Science

Author: Rajiv Asthana
Publisher: Elsevier
ISBN: 0080464882
Size: 14.84 MB
Format: PDF, Kindle
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“Materials Science in Manufacturing focuses on materials science and materials processing primarily for engineering and technology students preparing for careers in manufacturing. The text also serves as a useful reference on materials science for the practitioner engaged in manufacturing as well as the beginning graduate student. Integrates theoretical understanding and current practices to provide a resource for students preparing for advanced study or career in industry. Also serves as a useful resource to the practitioner who works with diverse materials and processes, but is not a specialist in materials science. This book covers a wider range of materials and processes than is customary in the elementary materials science books. This book covers a wider range of materials and processes than is customary in the elementary materials science books. * Detailed explanations of theories, concepts, principles and practices of materials and processes of manufacturing through richly illustrated text * Includes new topics such as nanomaterials and nanomanufacturing, not covered in most similar works * Focuses on the interrelationship between Materials Science, Processing Science, and Manufacturing Technology

Semiconductor Manufacturing Handbook

Author: Hwaiyu Geng
Publisher: McGraw-Hill Education
ISBN: 9781259587696
Size: 43.97 MB
Format: PDF, ePub, Mobi
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Fully updated, state-of-the-art semiconductor design and manufacturing information This fully updated handbook provides cutting-edge technologies and state-of-the-art processes needed to design and fabricate IC chips, MEMS, sensors, and other electronic devices. The book lays out the electronics fundamentals and techniques that are required to understand and accelerate the pace of innovation. Semiconductor Manufacturing Handbook, Second Edition consolidates many complex engineering and manufacturing disciplines into one volume, enabling the quick look up of specific reference data. Readers will get complete details on semiconductor fundamentals and basic materials, front-end of line processes, back-end of line processes, nanotechnology, MEMS, photovoltaics, gases and chemicals, and fab yield, operations and facilities. Covers the breadth and width of emerging technologies and manufacturing processes that enable big data, the Internet of Things, and smart manufacturing Fully explains global regulations and environmental requirements Written by 50 international experts and reviewed by a seasoned advisory board

Plasma Processes For Semiconductor Fabrication

Author: W. N. G. Hitchon
Publisher: Cambridge University Press
ISBN: 9780521018005
Size: 73.60 MB
Format: PDF, Kindle
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Plasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.

Handbook Of Semiconductor Manufacturing Technology Second Edition

Author: Yoshio Nishi
Publisher: CRC Press
ISBN: 9781420017663
Size: 40.59 MB
Format: PDF
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Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.

Advances In Cmp Polishing Technologies For The Manufacture Of Electronic Devices

Author: Toshiro Doi
Publisher: William Andrew
ISBN: 1437778593
Size: 47.86 MB
Format: PDF, ePub
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CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. Advances in CMP/Polishing Technologies for Manufacture of Electronic Devices presents the latest developments and technological innovations in the field - making cutting-edge R&D accessible to the wider engineering community. Most of the applications of these processes are kept as confidential as possible (proprietary information), and specific details are not seen in professional or technical journals and magazines. This book makes these processes and applications accessible to a wider industrial and academic audience. Building on the fundamentals of tribology - the science of friction, wear and lubrication - the authors explore the practical applications of CMP and polishing across various market sectors. Due to the high pace of development of the electronics and semiconductors industry, many of the presented processes and applications come from these industries. Demystifies scientific developments and technological innovations, opening them up for new applications and process improvements in the semiconductor industry and other areas of precision engineering Explores stock removal mechanisms in CMP and polishing, and the challenges involved in predicting the outcomes of abrasive processes in high-precision environments The authors bring together the latest innovations and research from the USA and Japan

Semiconductor Technology

Author: Michael E. Levinshtein
Publisher: Wiley-Interscience
ISBN: 9780471127925
Size: 22.68 MB
Format: PDF
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The product of decades of Russian research in semiconductor technology, this invaluable book offers Western researchers and engineers a wide range of new techniques, recipes, and characterization methods that provide simpler, cheaper, and more effective solutions to problems in semiconductor processing and fabrication. Many of these approaches appear here for the first time in Western technological literature.