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Advances In Imaging And Electron Physics

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Publisher: Academic Press
ISBN: 9780080569130
Size: 24.96 MB
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Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. An important feature of these Advances is that the subjects are written in such a way that they can be understood by readers from other specialities.

Advances In Imaging And Electron Physics

Author: Kevin Jensen
Publisher: Elsevier
ISBN: 0080556833
Size: 32.25 MB
Format: PDF, ePub, Mobi
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Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. This thematic volume is on the topic of "Field-emission Source Mechanisms" and is authored by Kevin Jensen, Naval Research Laboratory, Washington, DC.

Advances In Imaging And Electron Physics

Author: Peter W. Hawkes
Publisher: Academic Press
ISBN: 0123859816
Size: 69.34 MB
Format: PDF, ePub
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Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Contributions from leading international scholars and industry experts Discusses hot topic areas and presents current and future research trends Invaluable reference and guide for physicists, engineers and mathematicians

Advances In Imaging And Electron Physics

Author: Jay Theodore Cremer, Jr.
Publisher: Academic Press
ISBN: 0123944228
Size: 60.77 MB
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This special volume of Advances in Imaging and Electron Physics details the current theory, experiments, and applications of neutron and x-ray optics and microscopy for an international readership across varying backgrounds and disciplines. Edited by Dr. Ted Cremer, these volumes attempt to provide rapid assimilation of the presented topics that include neutron and x-ray scatter, refraction, diffraction, and reflection and their potential application. Contributions from leading authorities Informs and updates on all the latest developments in the field

Theory Of Intense Beams Of Charged Particles

Author: Valeriy A. Syrovoy
Publisher: Academic Press
ISBN: 0123813107
Size: 13.41 MB
Format: PDF, Kindle
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Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains. Contributions from leading international scholars and industry experts Discusses hot topic areas and presents current and future research trends Invaluable reference and guide for physicists, engineers and mathematicians

Electron Backscatter Diffraction In Materials Science

Author: Adam J. Schwartz
Publisher: Springer Science & Business Media
ISBN: 9780306464874
Size: 57.69 MB
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Crystallographic texture or preferred orientation has long been known to strongly influence material properties. Historically, the means of obtaining such texture data has been though the use of x-ray or neutron diffraction for bulk texture measurements, or transmission electron microscopy or electron channeling for local crystallographic information. In recent years, we have seen the emergence of a new characterization technique for probing the microtexture of materials. This advance has come about primarily through the automated indexing of electron backscatter diffraction (EBSD) patterns. The first commercially available system was introduced in 1994, and since then of sales worldwide has been dramatic. This has accompanied widening the growth applicability in materials scienceproblems such as microtexture, phase identification, grain boundary character distribution, deformation microstructures, etc. and is evidence that this technique can, in some cases, replace more time-consuming transmission electron microscope (TEM) or x-ray diffraction investigations. The benefits lie in the fact that the spatial resolution on new field emission scanning electron microscopes (SEM) can approach 50 nm, but spatial extent can be as large a centimeter or greater with a computer controlled stage and montagingofthe images. Additional benefits include the relative ease and low costofattaching EBSD hardware to new or existing SEMs. Electron backscatter diffraction is also known as backscatter Kikuchi diffraction (BKD), or electron backscatter pattern technique (EBSP). Commercial names for the automation include Orientation Imaging Microscopy (OIMTM) and Automated Crystal Orientation Mapping (ACOM).