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Advances In Imaging And Electron Physics

Author:
Publisher: Academic Press
ISBN: 012815540X
Size: 18.34 MB
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Advances in Imaging and Electron Physics, Volume 208, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy and the computing methods used in all these domains. Contains contributions from leading authorities on the subject matter Informs and updates on the latest developments in the field of imaging and electron physics Provides practitioners interested in microscopy, optics, image processing, mathematical morphology, electromagnetic fields, electrons and ion emission with a valuable resource Features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing

Advances In Imaging And Electron Physics

Author: Peter W. Hawkes
Publisher: Academic Press
ISBN: 9780080525471
Size: 59.98 MB
Format: PDF
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Advances in Imaging and Electron Physics merges two long-running serials--Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Advances In Imaging And Electron Physics

Author: Beate Meffert
Publisher: Elsevier
ISBN: 0080526241
Size: 31.50 MB
Format: PDF, ePub, Docs
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Advances in Imaging and Electron Physics merges two long-running serials-Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. This series features extended articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in all these domains.

Electron Backscatter Diffraction In Materials Science

Author: Adam J. Schwartz
Publisher: Springer Science & Business Media
ISBN: 9780306464874
Size: 54.47 MB
Format: PDF, Docs
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Crystallographic texture or preferred orientation has long been known to strongly influence material properties. Historically, the means of obtaining such texture data has been though the use of x-ray or neutron diffraction for bulk texture measurements, or transmission electron microscopy or electron channeling for local crystallographic information. In recent years, we have seen the emergence of a new characterization technique for probing the microtexture of materials. This advance has come about primarily through the automated indexing of electron backscatter diffraction (EBSD) patterns. The first commercially available system was introduced in 1994, and since then of sales worldwide has been dramatic. This has accompanied widening the growth applicability in materials scienceproblems such as microtexture, phase identification, grain boundary character distribution, deformation microstructures, etc. and is evidence that this technique can, in some cases, replace more time-consuming transmission electron microscope (TEM) or x-ray diffraction investigations. The benefits lie in the fact that the spatial resolution on new field emission scanning electron microscopes (SEM) can approach 50 nm, but spatial extent can be as large a centimeter or greater with a computer controlled stage and montagingofthe images. Additional benefits include the relative ease and low costofattaching EBSD hardware to new or existing SEMs. Electron backscatter diffraction is also known as backscatter Kikuchi diffraction (BKD), or electron backscatter pattern technique (EBSP). Commercial names for the automation include Orientation Imaging Microscopy (OIMTM) and Automated Crystal Orientation Mapping (ACOM).

Synchrotron Radiation

Author: Helmut Wiedemann
Publisher: Springer Science & Business Media
ISBN: 9783540433927
Size: 27.15 MB
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In this book the characteristics of synchrotron radiation, including insertion device radiation, are described and derived from first principles. The reader is first introduced to the subject in an intuitive way in order to gain familiarity with the underlying physical processes. A rigorous mathematical derivation of the theory then follows. Since the characteristics of synchrotron radiation are intimately connected with the parameters of the electron beam and its accelerator, a basic introduction to electron beam dynamics and accelerator design is included. The book is aimed at graduate students and scientists working with synchrotron radiation and is designed to serve both as a textbook and as a reference work. It includes numerous exercises, some with solutions.